Shadow Mask Design and Manufacturing
The device and circuit layout is converted into a thin film model consisting of a sequence of materials and corresponding shadow masks.
The CAD device and circuit layout determines the shadow mask pattern. Each mask layer is manufactured with a state-of-the art direct write exposure system that creates a mask mandrel with the desired aperture pattern. The mandrels are used as templates to electroform the shadow masks.
The combination of direct write patterning and electroforming generates masks directly from a digital model with quick turnaround time. This flexible, custom approach warrants superior mask aperture precision and repeatability in respect to aperture dimensions, location, sidewall definition.